兰长勇

个人信息Personal Information

副教授 硕士生导师

性别:男

毕业院校:南京大学

学历:博士研究生毕业

学位:理学博士学位

在职信息:在岗

所在单位:光电科学与工程学院

学科:光学工程

办公地点:4号科研楼B区(光电学院)#310-3

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Reactive Sputter Deposition of WO3/Ag/WO3 Film for Indium Tin Oxide (ITO)-Free Electrochromic Devices

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发表刊物:ACS Applied Materials & Interfaces

关键字:electrochromic; reactive sputtering; sacrificial layer; transparent conductor; WO3/Ag/WO3 film

摘要:Functioning both as electrochromic (EC) and transparent-conductive (TC) coatings, WO3/Ag/WO3 (WAW) trilayer film shows promising potential application for ITO-free electrochromic devices. Reports on thermal-evaporated WAW films revealed that these bifunctional WAW films have distinct EC characteristics; however, their poor adhesive property leads to rapid degradation of coloring-bleaching cycling. Here, we show that WAW film with improved EC durability can be prepared by reactive sputtering using metal targets. We find that, by introducing an ultrathin tungsten (W) sacrificial layer before the

论文类型:基础研究

卷号:8

期号:6

页面范围:3861–3867

是否译文:

发表时间:2016-02-05

收录刊物转向链接:pubs.acs.org/doi/abs/10.1021/acsami.5b10665

发表时间:2016-02-05