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Improving the imaging quality of MOEs in DMD-based maskless lithography, Microelectronic engineering, 2010, 87:1100-1103

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All the Authors: Yongzhi Liu,Xiaowei Guo

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Pre One:Qiming Dong:Coupled surface plasmon interference lithography based on metal-bounded dielectric structure, Journal of applied physics, 2010,108(11), 1101-1105

Next One:(2010): A wide tuning range electro-optic filter based on long-period waveguide grating, Chinese Science Bulletin, 55(3), 1−5

郭小伟

Gender:Male Education Level:With Certificate of Graduation for Doctorate Study Degree:Doctor of Science Status:On the job E-Mail:

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