郭小伟
开通时间:..
最后更新时间:..
点击次数:
全部作者: Yongzhi Liu, Yong Liu, Heping Li, Xiaoxia Zhang,Xiaowei Guo
是否译文:否
上一条:Improving the imaging quality of MOEs in DMD-based maskless lithography, Microelectronic engineering, 2010, 87:1100-1103
下一条:Qiming Dong, long range surface plasmon interference lithography, Microelectronic engineering, 2011, 88 (8), 2184-2187