Wen Qiye

Doctor of Engineering

With Certificate of Graduation for Doctorate Study

Personal Information

Gender:Male
Date of Employment:2005-04-01
E-Mail:

VIEW MORE

Other Contact Information

Email:


Home > Scientific Research > Paper Publications

Characterization of sputtering CoFe-ITO junction for spin injection

Hits:

Affiliation of Author(s):[1]Univ Elect Sci & Technol China, Key Lab Elect Film & Integrated Devices, Chengdu 610054, Peoples R China
Journal:RARE METALS
Key Words:ferromagnetic semiconductor junction; I-V characteristic; magnetoresistance; spin injection
Abstract:The combination of ferromagnetic metal (FM) and semiconductor (SC) for spin injection was studied and demonstrated with FM-SC-FM junction. The semiconductor was chosen to be doped Indium-Tin-Oxide (ITO). Both ITO single-layer film and CoFe-ITO-CoFe junction were sputtering deposited. The ITO single-layer film was n-type with a small resistance of about 100 Omega/Square. I-V curves and Magnetoresistance (MR) effect of the CoFe-ITO-CoFe junction were measured at room temperature and 77 K. Results show that the CoFe forms an ohmic contact to ITO film. But at low temperature, the I-V curves show a Schottky-like characteristic, which is strongly affect by applied magnetic field. The MR effect was measured to be 1% at 77 K, which indicates a spin injection into semiconductor to be realized in this sandwich junction.
Document Type:Article; Proceedings Paper
Volume:25
Page Number:536-539
ISSN No.:1001-0521
Translation or Not:no