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个人信息Personal Information
教授 博士生导师
性别:男
毕业院校:电子科技大学
学历:博士研究生毕业
学位:工学博士学位
在职信息:在职人员
所在单位:电子科学与工程学院
入职时间:2005-04-01
办公地点:电子科技大学5号科研楼
Characterization of sputtering CoFe-ITO junction for spin injection
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所属单位:[1]Univ Elect Sci & Technol China, Key Lab Elect Film & Integrated Devices, Chengdu 610054, Peoples R China
发表刊物:RARE METALS
关键字:ferromagnetic semiconductor junction; I-V characteristic; magnetoresistance; spin injection
摘要:The combination of ferromagnetic metal (FM) and semiconductor (SC) for spin injection was studied and demonstrated with FM-SC-FM junction. The semiconductor was chosen to be doped Indium-Tin-Oxide (ITO). Both ITO single-layer film and CoFe-ITO-CoFe junction were sputtering deposited. The ITO single-layer film was n-type with a small resistance of about 100 Omega/Square. I-V curves and Magnetoresistance (MR) effect of the CoFe-ITO-CoFe junction were measured at room temperature and 77 K. Results show that the CoFe forms an ohmic contact to ITO film. But at low temperature, the I-V curves show a Schottky-like characteristic, which is strongly affect by applied magnetic field. The MR effect was measured to be 1% at 77 K, which indicates a spin injection into semiconductor to be realized in this sandwich junction.
文献类型:Article; Proceedings Paper
卷号:25
页面范围:536-539
ISSN号:1001-0521
是否译文:否
