Shiwen Lei
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一种基于非均匀子阵结构的低副瓣波束赋形方法
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Patent Coverage: 中国大陆

School Sign: 电子科技大学

Type of Patent: 发明

State of Patent: 专利申请

Application Number: CN202111305992.5

Number of Inventors: 9

Service Invention or Not: yes

Application Date: 2021-11-25

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Associate Researcher
Supervisor of Master's Candidates

Gender : Male

Education Level : With Certificate of Graduation for Doctorate Study

Degree : Doctor of Engineering

Status : Professor

Date of Employment : 2020-04-01

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