周吴

个人信息Personal Information

教授 博士生导师

性别:男

毕业院校:西南交通大学

学历:博士研究生毕业

学位:工学博士学位

在职信息:在职人员

所在单位:机械与电气工程学院

入职时间:2010-08-20

学科:机械工程

办公地点:电子科技大学清水河校区成电国际创新中心B栋303

曾获荣誉:成都市“蓉漂”人才计划、深圳“鹏城孔雀计划”人才。

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2016年9月10日:团队在《Microelectronics Reliability》上发表关于MEMS器件电介质充电的综述文章!

发布时间:2024-09-24   点击次数:

The movement or migration of charges in dielectric materials like silicon oxide, silicon nitride and glass, is recognized as one of the most significant causes of drift instability of MEMS devices which utilize electrostatic capacitive methods for sensing and driving. This paper reviews the current researches on the characteristics of drift phenomenon of three micro capacitive devices, micro switches, micro resonators and micro mirrors. The dielectric charging forms including polarization, ion injection and charge migration are presented in detail to explain the process and mechanism of how the charging effects gives rise to the drift of performance and influence the reliability of micro systems, and then the corresponding solutions to overcome specific drift issues are proposed based on the essential conditions needed to cause dielectric charging.