周吴

个人信息Personal Information

教授 博士生导师

性别:男

毕业院校:西南交通大学

学历:博士研究生毕业

学位:工学博士学位

在职信息:在职人员

所在单位:机械与电气工程学院

入职时间:2010-08-20

学科:机械工程

办公地点:电子科技大学清水河校区成电国际创新中心B栋303

曾获荣誉:成都市“蓉漂”人才计划、深圳“鹏城孔雀计划”人才。

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2020年7月1日:团队在《J. Micromech. Microeng. 》上发表关于微加速度传感器上电漂移的论文,祝贺!!

发布时间:2024-09-24   点击次数:

The drift phenomena of closed-loop capacitive silicon-based micro accelerometers have been hindering their application in the area of precise and rapid industrial positioning, which especially requires a good dynamic performance. Using both theoretical methods and experiments, this paper will systematically investigate the underlying mechanisms of such phenomena. The possible causes of drift, including thermal effects, dynamic response, capacitor charging and dielectric charging, as described in current literature, were evaluated by specific tests. As a result, the first three factors were ruled out as the cause of drift, by both theoretical derivation and experimental observation, and only dielectric charging was identified as the most plausible contributor to the drift. The movement of charges in SiOx on electrodes and glass substrates forms an additional electrostatic field that disturbs the system balance and results in
the variation of accelerometer output. The materials analysis and shielding tests carried out demonstrated that the drift phenomena of more than 60% of the tested accelerometers can be explained by the charging effect of dielectric materials, while the remaining sensors require further tests and more complicated models to determine the causes of this drift. The conclusions presented in this paper provide meaningful guidance for improving accelerometer performance in order to meet the demands of high accuracy industrial applications.